Chemistry of Atomic Layer Deposition

Belux 3 Training School

HERALD COST action (MP1401: Hooking together European research in Atomic Layer Deposition) and MASSENA doctoral program (Materials for Sensing and Energy harvesting) co-organize a Training School entitled “Chemistry of Atomic Layer Deposition”.

Experts from ALD-complementary fields animate a two days’ interactive training school about aspects associated with the chemistry behind the ALD process.

The following aspects will be addressed:

1-      ALD opportunities and challenges
Dr. Elisabeth Blanquet, Univ. Grenoble Alps, Research Director, SIMAP, France
ResearchGate, Linkedin

2-      Precursor design and its impact on the ALD chemistry and kinetics
Dr. Jean-Marc Girard
, CTO and Head of R&D at Air Liquide Advanced Materials, France
Linkedin

3-      Modelling aspects and tools
Dr. Alain Estève
, Research Director, Head of NEO group “Nano-Engineering and integration of metal-Oxide-based nanostructures and their interfaces” LAAS-CNRS, France
ResearchGate,

4-      In situ investigation of the ALD process
Dr. Martin Knaut
, Institute of Semiconductors and Microsystems, Dresden, Germany
ResearchGate, Linkedin

5-      Approaches for area-selective ALD
Dr. Christophe Vallée
, CEA – LETI - MINATEC, Grenoble, France. Head of the material department of Polytech Grenoble, Professor at Grenoble Alpes University and at Tsukuba University (Japan).
ResearchGate
, Linkedin

Poster presentation

To enhance the interaction with the trainers, participants active in the field of ALD, or in activities in which ALD might play a role, are encouraged to prepare an A0 poster support.

Grants

Limited number of travel grants (650 €/participant) will be given upon evaluation of applications. Participation from ITC countries is strongly encouraged. Thank you to inform us of your application in the registration form.

Organization

Naoufal Bahlawane, Scientific Coordinator, Luxembourg institute of Science and Technology, Luxembourg
Sven Van Elshocht, Scientific Coordinator, imec, Belgium
Magalie Briquet, Support Officer, Luxembourg institute of Science and Technology, Luxembourg
Marylène Martin, Event Officer, Luxembourg institute of Science and Technology, Luxembourg

Objectives

The training provides essential basis of the chemistry behind the ALD process for multidisciplinary researchers, PhD candidates, Master students and process or R&D engineers from public and private sectors.

Programme

 

19  March 2018

13.30 - 14.00: Welcome coffee and registration

14.00 – 15.00:  ALD opportunities and challenges Dr. Elisabeth Blanquet

15.00 – 15.40:  Modelling aspects and tools (Part I) Dr. Alain Estève

15.40 - 16.00: Coffee break

16.00 – 16.40:  Modelling aspects and tools (Part II) Dr. Alain Estève

17.00 – 18.00:  Poster discussion

19:00 – 21:00:  Dinner

20  March 2018

8.30 - 9.00: Welcome coffee

9.00 – 10.00:  In situ investigation of the ALD process Dr. Martin Knaut

10.00 – 10.45:  Approaches for area-selective ALD (Part I) Christophe Vallée

10.45 - 11.15: Coffee break

11.15 – 12.00:  Approaches for area-selective ALD (Part II) Christophe Vallée

12:00 – 13:00:  Lunch

13:00 – 14:00:  Precursor design and its impact on the ALD chemistry and kinetics, Dr. Jean-Marc Girard

14:00 – 16:00:  Poster discussion

Partners

Co-organizing entities:

HERALD COST action

PRIDE doctoral school, MASSENA

 

 

 

Share this page:

Chemistry of Atomic Layer Deposition

The presentations are available online

Practical Infos

Dates: 19-20 March 2018

Venue: Luxembourg Institute of Science and technology | 41 rue du Brill, L-4422 Belvaux

Language: English

Registration fees: No participation fees but registration is mandatory.

Registration deadline: 12 March 2018

Contact: event@list.lu

Accomodation: Some hotel rooms are available at Ibis hotel in Belval until 8 March 2018.
To book an hotel room, please use this booking form with the reference number 782631.