The Luxembourg Institute of Science and Technology (LIST) will organize the EuroCVD 22 - Baltic ALD 16 from 24 to 28 June 2019 in Luxembourg.
Chemical Vapor deposition (CVD) and Atomic Layer Deposition (ALD) are essential and versatile tools for the development of innovative materials and architectures that are the hart of modern nanotechnology.
The conference subscribes within the biennial series of European CVD conferences, which started in Paris (1977), and the Baltic ALD series launched as Atomic Layer Epitaxy Symposium in Helsinki (1991). From the process and materials development perspectives, this conference will be a showcase of the forefront research addressing up-to-date challenges and stat-of-the-art chemical processing from the gas phase (CVD, ALD, Energy assisted CVD/ALD, MOVPE, RIE, ALE). The conference covers processes that are performed at atmospheric pressure, low vacuum and ultra-high vacuum, and processes that are assisted thermally or with other means such plasma, plasmon, light, electrical field, hot wire, …
The EuroCVD 22 – Baltic ALD 16 will offer a high quality scientific program with invited and contributed lectures in key development areas based the chemical processing from the gas phase.
More details are available on the conference website: http://www.eurocvd-balticald2019.lu/
Dates: 24-28 June 2019
Duration: 5 days
Venue: LUXEXPO The Box | 10, Circuit de la Foire Internationale | L-1347 Luxembourg-Kirchberg