Contract type: Internship
Duration: 6 months
Metal-organic compounds have met a broad range of applications, including catalysis, sensing of energy storage. For their most advanced technological applications their synthesis in thin film form is required. Among numerous way to obtain thin films, the Chemical Vapour Deposition (CVD) has a strong advantage of allowing the simultaneous synthesis and deposition of thin films without any use of solvents. Recently, we successfully investigated metalloporphyrins building blocks of ultrathin metal-organic thin films. Our dry and low temperature CVD approach allows the deposition of functional metal-organic thin films on an increasing number of substrates, e.g. paper, polymers and glass, and broaden the scope of applications of metal-organic compounds.
The internship position will assist our ongoing investigations on the Chemical Vapour Deposition (CVD) of functional metal-organic thin films. The Master Student will notably focus on the 1) CVD of the metal-organic thin films; 2) Physico-chemical characterization of the coatings, e.g. Raman and UV-Vis-NIR spectroscopy, mass spectrometry, AFM and SEM; and 3) Study of the reaction mechanisms by means of density functional theory (DFT). An internship report written in English is expected at the end of the training period.