On the origin of the large remanent polarization in La:HfO2
19/09/2019
Authors
T. Schenk, C. M. Fancher, M. H. Park, C. Richter, C. Künneth, A. Kersch, J. L. Jones, T. Mikolajick, and U. Schroeder
Reference
Advanced Electronic Materials, vol. 5, no. 12, art. no. 1900303, 2019
