On the origin of the large remanent polarization in La:HfO₂

Authors

T. Schenk, C. M. Fancher, M. H. Park, C. Richter, C. Künneth, A. Kersch, J. L. Jones, T. Mikolajick, and U. Schroeder

Reference

Advanced Electronic Materials, vol. 5, no. 12, art. no. 1900303, 2019

Link

doi:10.1002/aelm.201900303