The Chemistry of Atomic Layer Deposition: a unique technique under the spotlight of BeLux3

Published on 04/04/2018

On 19-20 March 2018, in the framework of its activities in Materials Research and Technology (MRT), the Luxembourg Institute of Science and Technology (LIST) together with the HERALD COST action and the Luxembourg National Research Fund (FNR), organised the Training School on the Chemistry of Atomic Layer Deposition (BeLux3) in Luxembourg, at LIST's premises.

BeLux3 at a glance

The BeLux workshop series is organised since 2014 alternatively by LIST and its partner imec - the world-leading R&D and innovation hub in nanoelectronics and digital technologies. The 2018 edition was organised in the framework of the ongoing doctoral programme "Materials for Sensing and Energy Harvesting"(MASSENA).

In a nutshell, the training chaired by M. Bahlawane (LIST) and M. Van Elshocht (imec), provided essential basis of the chemistry behind the ALD process for multidisciplinary researchers, PhD candidates, Master students and process or R&D engineers from public and private sectors. Five valuable and highly engaged trainers have animated this training school and addressed aspects related to the challenges and opportunities that the Atomic layer Deposition (ALD) present: precursor designs, approaches to selective area deposition, modelling and in situ monitoring. BeLux3 hosted in total 45 participants out of 10 countries and gathered delegates from four industrials. 

About Atomic layer deposition and LIST

ALD is a unique technique for growing highly conformal and ultra-thin films, enabling new developments in high-tech manufacturing sectors such as electronics, energy and functional coatings. The scientific collaborations in HERALD cover new processes (precursor chemicals and equipment), fundamental understanding (metrology and modeling), innovative materials (nanoscale interfaces, 2D materials) and applications (semiconductor devices, photovoltaics, energy storage, sensors, protective coatings for organic elements and fibres). View the source page and more info on european-ald.net.

In this context, HERALD promotes European research activity in ALD. HERALD (COST action MP1402) aims to structure and integrate European research activity in ALD, bringing together existing groups, promoting young scientists and reaching out to industry and the public. 

The ALD is a process of choice for many developments carried out in the MRT department at LIST, either in the context of industrial collaborations or as part of competitive national funding projects. The innovations targeted in LIST cover the chemistry of deposition, process development, prototyping and process integration in addition to the functionality evaluation (e.g. optics, electrics and catalysis). The ALD will potentially play an enhanced role in the future developments at LIST.

> For any question on this topic, contact Naoufal Bahlawane via email. 

> View the pictures directly on photogallery.list.lu

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Dr Naoufal BAHLAWANE
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