A method for quantitative nanoscale imaging of dopant distributions using secondary ion mass spectrometry: an application example in silicon photovoltaics

02/09/2019

Authors

S. Eswara, A. Pshenova, E. Lentzen, G. Nogay, M. Lehmann, A. Ingenito, Q. Jeangros, F.-J. Haug, N. Valle, P. Philipp, A. Hessler-Wyser, and T. Wirtz

Reference

MRS Communications, doi:10.1557/mrc.2019.89, 2019

Link

doi:10.1557/mrc.2019.89

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