Gas separation: Metal-organic covalent network chemical vapor deposition for gas separation

Authors

N. D. Boscher, M. Wang, A. Perrotta, K. Heinze, M. Creatore, and K. K. Gleason

Reference

Advanced Materials, vol. 28, no. 34, p. 7478, 2016

Description

The chemical vapor deposition polymerization of metalloporphyrin building units provides an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers, supported on poly[1-(trimethylsilyl)-1-propyne], exhibit outstanding gas-separation performances for multiple gas pairs, as described on page 7479 by K. K. Gleason and co-workers.

Link

DOI: 10.1002/adma.201670240

Share this page: