Influence of double bonds and cyclic structure on the AP-PECVD of low-k organosilicon insulating layers

20/01/2021

Authors

D. Abessolo Ondo, F. Loyer, and N. D. Boscher

Reference

Plasma Processes and Polymers, doi:10.1002/ppap.202000222, 2021

Link

doi:10.1002/ppap.202000222

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