A method for quantitative nanoscale imaging of dopant distributions using secondary ion mass spectrometry: an application example in silicon photovoltaics
Auteurs
S. Eswara, A. Pshenova, E. Lentzen, G. Nogay, M. Lehmann, A. Ingenito, Q. Jeangros, F.-J. Haug, N. Valle, P. Philipp, A. Hessler-Wyser, and T. Wirtz
Référence
MRS Communications, vol. 9, no. 3, pp. 916-923, 2019
