Atmospheric pressure plasma initiated chemical vapor deposition using ultra-short square pulse dielectric barrier discharge

14/01/2015

Auteurs

N. D. Boscher, F. Hilt, D. Duday, G. Frache, T. Fouquet, and P. Choquet

Référence

Plasma Processes and Polymers, vol. 12, no. 1, pp. 66-74, 2015

Description

A simple, efficient and scalable method for the atmospheric pressure plasma initiated chemical vapor deposition of conventional polymer is demonstrated. Ultra-short square pulse dielectric barrier discharge, which allows high deposition rates even for plasma duty cycle as low as 0.01%, is used to deposit a glycidyl methacrylate (GMA) polymer layer. The polymer structure of the thin films is evidenced by matrix-assisted laser desorption/ionization high-resolution mass spectrometry. Polymer molecular weights up to 30 000 g mol−1 are found by size exclusion chromatography (SEC), highlighting the suitability of the plasma initiated CVD method for the deposition of polymer layers.

Lien

DOI: 10.1002/ppap.201400094

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