Atmospheric pressure plasma initiated chemical vapor deposition using ultra-short square pulse dielectric barrier discharge
Auteurs
N. D. Boscher, F. Hilt, D. Duday, G. Frache, T. Fouquet, and P. Choquet
Référence
Plasma Processes and Polymers, vol. 12, no. 1, pp. 66-74, 2015
Description
A simple, efficient and scalable method for the atmospheric pressure plasma initiated chemical vapor deposition of conventional polymer is demonstrated. Ultra-short square pulse dielectric barrier discharge, which allows high deposition rates even for plasma duty cycle as low as 0.01%, is used to deposit a glycidyl methacrylate (GMA) polymer layer. The polymer structure of the thin films is evidenced by matrix-assisted laser desorption/ionization high-resolution mass spectrometry. Polymer molecular weights up to 30 000 g mol−1 are found by size exclusion chromatography (SEC), highlighting the suitability of the plasma initiated CVD method for the deposition of polymer layers.
