Atmospheric-pressure synthesis of atomically smooth, conformal, and ultrathin low-k polymer insulating layers by plasma-initiated chemical vapor deposition
Auteurs
D. Abessolo Ondo, F. Loyer, F. Werner, R. Leturcq, P. J. Dale, and N. D. Boscher
Référence
ACS Applied Polymer Materials, vol. 1, no. 12, pp. 3304-3312, 2019
