Atomic layer deposition of vanadium oxides: process and application review
V. P. Prasadam, N. Bahlawane, F. Mattelaer, G. Rampelberg, C. Detavernier, L. Fang, Y. Jiang, K. Martens, I. P. Parkin, and I. Papakonstantinou
Materials Today Chemistry, vol. 12, pp. 396-423, 2019
doi:10.1016/j.mtchem.2019.03.004