Gas separation: Metal-organic covalent network chemical vapor deposition for gas separation
Auteurs
N. D. Boscher, M. Wang, A. Perrotta, K. Heinze, M. Creatore, and K. K. Gleason
Référence
Advanced Materials, vol. 28, no. 34, p. 7478, 2016
Description
The chemical vapor deposition polymerization of metalloporphyrin building units provides an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers, supported on poly[1-(trimethylsilyl)-1-propyne], exhibit outstanding gas-separation performances for multiple gas pairs, as described on page 7479 by K. K. Gleason and co-workers.
