On the origin of the large remanent polarization in La:HfO₂

Auteurs

T. Schenk, C. M. Fancher, M. H. Park, C. Richter, C. Künneth, A. Kersch, J. L. Jones, T. Mikolajick, and U. Schroeder

Référence

Advanced Electronic Materials, vol. 5, no. 12, art. no. 1900303, 2019

Lien

doi:10.1002/aelm.201900303