Patterning enhanced tetragonality in BiFeO3 thin films with effective negative pressure by helium implantation

Auteurs

C. Toulouse, J. Fischer, S. Farokhipoor, L. Yedra, F. Carlà, A. Jarnac, E. Elkaim, P. Fertey, J. N. Audinot, T. Wirtz, B. Noheda, V. Garcia, S. Fusil, I. P. Alonso, M. Guennou, and J. Kreisel

Référence

Physical Review Materials, vol. 5, no. 2, art. no. 024404, 2021

Lien

doi:10.1103/PhysRevMaterials.5.024404

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