Plasma-initiated chemical vapour deposition of organosiloxane thin films: From the growth mechanisms to ultrathin low-k polymer insulating layers

08/04/2020

Auteurs

D. Abessolo Ondo, R. Leturcq, and N. D. Boscher

Référence

Plasma Processes and Polymers, art. no. e2000032, 2020

Lien

doi:10.1002/ppap.202000032

Partager cette page :