Plasma polymerisation of an allyl organophosphate monomer by atmospheric pressure pulsed-PECVD: Insights into the growth mechanisms
Auteurs
F. Hilt, D. Duday, N. Gherardi, G. Frache, J. Didierjean, and P. Choquet
Référence
RSC Advances, vol. 5, no. 6, pp. 4277-4285, 2015
Description
Atmospheric plasma deposition of DiEthylAllyl Phosphate (DEAP) has been performed to study the behaviour of an allylic phosphate-based monomer in a nitrogen Atmospheric Pressure-Dielectric Barrier Discharge (AP-DBD). The deposition kinetics and chemical structures of the different coatings have been studied as a function of the duty cycle and the power dissipated in the discharge. It has been highlighted that it is possible to obtain different chemistries, from organic coatings in which the monomer structure is remaining to inorganic polyphosphate-based ones. Different mechanisms of deposition have been outlined and discussed taking into account the deposition kinetics, the coatings chemistries and the monomer reactivity in the gas phase.
