PVD Pilot Line

In PVD processes, the material to be deposited, namely the target, is transformed into atomic particles by a thermal physical process of collision and directed to the substrates in a vacuum environment or gaseous plasma under low-pressure conditions, where they condense to form a physical coating.

Magnetron sputtering is a widely used technology for the deposition of coatings and thin films at laboratories and industries worldwide.  It is used to improve mechanical, optical, electrical properties, enhance tribological performance, or provide semiconductor properties to substrates that initially are not.

Advantages of Magnetron Sputtering

• Deposition of a wide range of inorganic materials: metals, carbides, nitrides, oxides…
• Ecofriendly: no chemicals are used, no wastes.
• Operates far from Thermodynamic equilibrium (plasma): non-conventional materials can be obtained.
• Coatings with high density and uniformity.
• High deposition rate
• Possible substrates: Metals, hard carbides, Paper, Textiles, Polymers, Glass, Semiconductors, Ceramics
• Versatile: a lot of options available to fine tune the deposition
• Scalable: easy lab-to-industry transfer

From lab to industrial scale

At LIST, we accompany your project from the development phase at lab scale, passing by the validation phase at semi-industrial scale, to the industrial phase with our 2x18m length Pilot Line, a unique installation in an RTO in Europe open for industrial collaborations.