Patterning enhanced tetragonality in BiFeO3 thin films with effective negative pressure by helium implantation

09/02/2021

Authors

C. Toulouse, J. Fischer, S. Farokhipoor, L. Yedra, F. Carlà, A. Jarnac, E. Elkaim, P. Fertey, J. N. Audinot, T. Wirtz, B. Noheda, V. Garcia, S. Fusil, I. P. Alonso, M. Guennou, and J. Kreisel

Reference

Physical Review Materials, vol. 5, no. 2, art. no. 024404, 2021

Link

doi:10.1103/PhysRevMaterials.5.024404

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